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Air-Stable Transport in Graphene-Contacted, Fully Encapsulated Ultrathin Black Phosphorus-Based Field-Effect Transistors

机译:石墨烯接触,完全封装的超薄黑磷基场效应晶体管的空气稳定输运

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摘要

The presence of direct bandgap and high mobility in semiconductor few-layer black phosphorus offers an attractive prospect for using this material in future two-dimensional electronic devices. However, creation of barrier-free contacts which is necessary to achieve high performance in black phosphorus-based devices is challenging and currently limits their potential for applications. Here, we characterize fully encapsulated ultrathin (down to bilayer) black phosphorus field effect transistors fabricated under inert gas conditions by utilizing graphene as source?drain electrodes and boron nitride as an encapsulation layer. The observation of a linear ISD?VSD behavior with negligible temperature dependence shows that graphene electrodes lead to barrier-free contacts, solving the issue of Schottky barrier limited transport in the technologically relevant two-terminal field-effect transistor geometry. Such one-atom-thick conformal source?drain electrodes also enable the black phosphorus surface to be sealed, to avoid rapid degradation, with the inert boron nitride encapsulating layer. This architecture, generally applicable for other sensitive two-dimensional crystals, results in air-stable, hysteresis-free transport characteristics.
机译:半导体少数层黑磷中存在直接带隙和高迁移率,为在未来的二维电子设备中使用这种材料提供了诱人的前景。然而,在黑磷基器件中实现高性能所必需的无障碍触点的创建具有挑战性,目前限制了它们在应用中的潜力。在这里,我们表征了在惰性气体条件下通过利用石墨烯作为源漏电极和氮化硼作为封装层制造的完全封装的超薄(至双层)黑磷场效应晶体管。对线性ISD?VSD行为的温度依赖性可忽略不计的观察结果表明,石墨烯电极可实现无势垒接触,从而解决了技术相关的两端场效应晶体管几何结构中肖特基势垒受限传输的问题。这种一原子厚的共形源漏电极还可以通过惰性氮化硼密封层密封黑磷表面,以避免快速降解。这种体系结构通常适用于其他敏感的二维晶体,​​因此具有空气稳定,无滞后的传输特性。

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